瀏覽 的方式： 作者 Chang, JJ
顯示 1 到 7 筆資料，總共 7 筆
| 公開日期 | 標題 | 作者 |
| 1-九月-2004 | Direct COSi2 thin-film formation with homogeneous nanograin-size distribution by oxide-mediated silicidation | Chang, JJ; Liu, CP; Chen, SW; Chang, CC; Hsieh, TE; Wang, YL; 材料科學與工程學系; Department of Materials Science and Engineering |
| 1-四月-2005 | Formation of pyramid-like nanostructures during cobalt film growth by magnetron sputtering | Liu, CP; Chang, JJ; Chen, SW; Chung, HC; Wang, YL; 材料科學與工程學系; Department of Materials Science and Engineering |
| 2001 | Investigation of the gate dielectric oxidation treatment in trench gate power devices | Lin, MJ; Liaw, CE; Chang, JJ; Chang, FL; Hsu, CCH; Cheng, HC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 24-一月-2005 | Modified polycrystalline silicon chemical-vapor deposition process for improving roughness at oxide/polycrystalline silicon interface | Chang, JJ; Hsieh, TE; Wang, YL; Tseng, WT; Liu, CP; Lan, CY; 材料科學與工程學系; Department of Materials Science and Engineering |
| 24-二月-2006 | The study of diffusion and nucleation for COSi2 formation by oxide-mediated cobalt silicidation | Chang, JJ; Liu, CP; Hsieh, TE; Wang, YL; 材料科學與工程學系; Department of Materials Science and Engineering |
| 1-九月-2005 | Study of diffusion and quality control for CoSi2 formation by oxide-mediated cobalt silicidation with Ti capping | Chang, JJ; Liu, CP; Hsieh, TE; Wang, YL; 材料科學與工程學系; Department of Materials Science and Engineering |
| 1-三月-2006 | Uniform COSi2 nano-nucleus formation by oxide mediated silicidation with a Ti capping layer | Chang, JJ; Hsieh, TE; Liu, CP; Wang, YL; 材料科學與工程學系; Department of Materials Science and Engineering |
