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Browsing by Author Chang, Wei-Yuan

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Showing results 1 to 9 of 9
Issue DateTitleAuthor(s)
1-Nov-2018Broadband UV-assisted thermal annealing of low-k silicon carbonitride films using a C-rich silazane precursorChang, Wei-Yuan; Chung, Hau-Ting; Chen, Yi-Chang; Leu, Jihperng; 材料科學與工程學系; Department of Materials Science and Engineering
1-Jan-2013Effect of Moisture on Electrical and Reliability Characteristics for Dense and Porous Low-k DielectricsCheng, Yi-Lung; Huang, Jun-Fu; Chang, Wei-Yuan; Chang, Yu-Min; Leu, Jihperng; 材料科學與工程學系; Department of Materials Science and Engineering
1-Feb-2014Effect of moisture on electrical properties and reliability of low dielectric constant materialsCheng, Yi-Lung; Leon, Ka-Wai; Huang, Jun-Fu; Chang, Wei-Yuan; Chang, Yu-Min; Leu, Jihperng; 材料科學與工程學系; Department of Materials Science and Engineering
1-May-2014Effect of NH3/N-2 ratio in plasma treatment on porous low dielectric constant SiCOH materialsHuang, Jun-Fu; Bo, Tain-Cih; Chang, Wei-Yuan; Chang, Yu-Min; Leu, Jihperng; Cheng, Yi-Lung; 材料科學與工程學系; Department of Materials Science and Engineering
15-Jan-2013Effect of thermal treatment on physical, electrical properties and reliability of porogen-containing and porogen-free ultralow-k dielectricsChang, Yu-Min; Chang, Wei-Yuan; Huang, Jun-Fu; Leu, Jihperng; Cheng, Yi-Lung; 材料科學與工程學系; Department of Materials Science and Engineering
1-Nov-2014Effect of UV curing time on physical and electrical properties and reliability of low dielectric constant materialsKao, Kai-Chieh; Chang, Wei-Yuan; Chang, Yu-Min; Leu, Jihperng; Cheng, Yi-Lung; 材料科學與工程學系; Department of Materials Science and Engineering
1-Jul-2019Embedded carbon bridges in low-k PECVD silicon carbonitride films using silazane precursorsChang, Wei-Yuan; Chen, Wei-Zhong; Lee, Hung-Tse; Leu, Jihperng; 材料科學與工程學系; Department of Materials Science and Engineering
2013Modeling Transaction Costs and Skewness in Portfolio: Application of Fuzzy ApproachYu, Jing-Rung; Chiou, Wan-Jiun Paul; Chang, Wei-Yuan; Lee, Wen-Yi; 科技管理研究所; Institute of Management of Technology
31-Aug-2017Optical properties of plasma-enhanced chemical vapor deposited SiCxNy films by using silazane precursorsChang, Wei-Yuan; Chang, Chieh-Yu; Leu, Jihperng; 材料科學與工程學系; Department of Materials Science and Engineering
Showing results 1 to 9 of 9