| 公開日期 | 標題 | 作者 |
| 1999 | Anti-reflection strategies for sub-0.18-mu m dual damascene structure patterning in KrF 248nm lithography | Chou, SY; Wang, CM; Hsia, CC; Chen, LJ; Hwang, GW; Lee, SD; Lou, JC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-二月-1999 | Barrier capabilities of selective chemical vapor deposited W films and WSiN/WSix/W stacked layers against Cu diffusion | Wang, MT; Chen, LJ; Chen, MC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 2-十一月-1998 | Characterization of multilayered Ti/TiN films grown by chemical vapor deposition | Hu, JC; Chang, TC; Chen, LJ; Yang, YL; Chang, CY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 31-十月-1997 | Characterization of TiN film grown by low-pressure-chemical-vapor-deposition | Mei, YJ; Chang, TC; Hu, JC; Chen, LJ; Yang, YL; Pan, FM; Wu, WF; Ting, A; Chang, CY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| - | Chemical mechanical polishing for selective CVD-W | Wang, MT; Yeh, WK; Tsai, MS; Tseng, WT; Chang, TC; Chen, LJ; Chen, MC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| - | Chemical mechanical polishing for selective CVD-W | Wang, MT; Yeh, WK; Tsai, MS; Tseng, WT; Chang, TC; Chen, LJ; Chen, MC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 30-十月-1997 | Chemical mechanical polishing for selective CVD-W | Wang, MT; Yeh, WK; Tsai, MS; Tseng, WT; Chang, TC; Chen, LJ; Chen, MC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 30-十月-1997 | Chemical mechanical polishing for selective CVD-W | Wang, MT; Yeh, WK; Tsai, MS; Tseng, WT; Chang, TC; Chen, LJ; Chen, MC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-三月-2005 | Coherent control multiphoton processes in semiconductor saturable Bragg reflector with freezing phase algorithm | Chen, MC; Huang, JY; Chen, LJ; 光電工程學系; Department of Photonics |
| 1-三月-2000 | Copper electroplating for future ultralarge scale integration interconnection | Gau, WC; Chang, TC; Lin, YS; Hu, JC; Chen, LJ; Chang, CY; Cheng, CL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-九月-2000 | Copper electroplating for future ultralarge scale integration interconnection (vol 18, pg 656, 2000) | Gau, WC; Chang, TC; Lin, YS; Hu, JC; Chen, LJ; Chang, CY; Cheng, CL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-七月-2000 | Effects of a new combination of additives in electroplating solution on the properties of Cu films in ULSI applications | Hu, JC; Chang, TC; Wu, CW; Chen, LJ; Hsiung, CS; Hsieh, WY; Lur, W; Yew, TR; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-七月-2000 | Effects of composition and N-2 plasma treatment on the barrier effectiveness of chemically vapor deposited WSix films | Wang, MT; Chuang, MH; Chen, LJ; Chen, MC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 31-十月-1997 | Effects of corrosion environments on the surface finishing of copper chemical mechanical polishing | Wang, MT; Tsai, MS; Liu, C; Tseng, WT; Chang, TC; Chen, LJ; Cheng, MC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 20-十月-1997 | Effects of isolation materials on facet formation for silicon selective epitaxial growth | Tseng, HC; Chang, CY; Pan, FM; Chen, JR; Chen, LJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-十一月-1999 | Electrical reliability issues of integrating thin Ta and TaN barriers with Cu and low-K dielectric | Wu, ZC; Wang, CC; Wu, RG; Liu, YL; Chen, PS; Zhu, ZM; Chen, MC; Chen, JF; Chang, CI; Chen, LJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 10-十二月-2001 | Enhanced dopant activation and elimination of end-of-range defects in BF2+-implanted silicon-on-insulator by high-density current | Lin, HH; Cheng, SL; Chen, LJ; Chen, C; Tu, KN; 材料科學與工程學系; Department of Materials Science and Engineering |
| 2001 | Evaluating the impact of spherical aberration on sub-0.2-micron contact/via hole patterning | Chou, SY; Lou, JC; Lai, CM; Liang, FJ; Chen, LJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-七月-2005 | Fabrication of NiSi2 nanocrystals embedded in SiO2 with memory effect by oxidation of the amorphous Si/Ni/SiO2 structure | Yeh, PH; Wu, HH; Yu, CH; Chen, LJ; Liu, PT; Hsu, CH; Chang, TC; 光電工程學系; Department of Photonics |
| 1-十一月-2001 | Focus latitude enhancement of symmetrical phase mask design for deep submicron contact hole patterning | Chou, SY; Lou, JC; Chen, LJ; Shiu, LH; Liu, RG; Wang, CM; Gau, TS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
