| Issue Date | Title | Author(s) |
| 1-Jul-2009 | High-Density and Low-Leakage-Current MIM Capacitor Using Stacked TiO(2)/ZrO(2) Insulators | Lin, S. H.; Chiang, K. C.; Chin, Albert; Yeh, F. S.; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-Jul-2009 | High-Density and Low-Leakage-Current MIM Capacitor Using Stacked TiO2/ZrO2 Insulators | Lin, S. H.; Chiang, K. C.; Chin, Albert; Yeh, F. S.; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-Sep-2006 | High-performance SrTiO3 MIM capacitors for analog applications | Chiang, K. C.; Huang, Ching-Chien; Chen, G. L.; Chen, Wen Jauh; Kao, H. L.; Wu, Yung-Hsien; Chin, Albert; McAlister, Sean P.; 奈米科技中心; Center for Nanoscience and Technology |
| 1-Mar-2007 | High-temperature leakage improvement in metal-insulator-metal capacitors by work-function tuning | Chiang, K. C.; Cheng, C. H.; Pan, H. C.; Hsiao, N.; Chou, C. P.; Chin, Albert; Hwang, H. L.; 機械工程學系; 電子工程學系及電子研究所; Department of Mechanical Engineering; Department of Electronics Engineering and Institute of Electronics |
| 1-Jul-2010 | Improved Capacitance Density and Reliability of High-k Ni/ZrO(2)/TiN MIM Capacitors Using Laser-Annealing Technique | Tsai, C. Y.; Chiang, K. C.; Lin, S. H.; Hsu, K. C.; Chi, C. C.; Chin, Albert; 電機工程學系; Department of Electrical and Computer Engineering |
| 1-Jul-2010 | Improved Capacitance Density and Reliability of High-k Ni/ZrO2/TiN MIM Capacitors Using Laser-Annealing Technique | Tsai, C. Y.; Chiang, K. C.; Lin, S. H.; Hsu, K. C.; Chi, C. C.; Chin, Albert; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-Dec-2009 | Improved Stress Reliability of Analog Metal-Insulator-Metal Capacitors Using TiO(2)/ZrO(2) Dielectrics | Lin, S. H.; Chiang, K. C.; Yeh, F. S.; Chin, Albert; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-Dec-2009 | Improved Stress Reliability of Analog Metal-Insulator-Metal Capacitors Using TiO2/ZrO2 Dielectrics | Lin, S. H.; Chiang, K. C.; Yeh, F. S.; Chin, Albert; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-Jan-2006 | A parallel coupled-line filter using VLSI backend interconnect with high resistivity substrate | Chen, C. C.; Kao, H. L.; Chiang, K. C.; Chin, Albert; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-Sep-2006 | RFIC TaN/SrTio(3)/TaN MIM capacitors with 35 fF/mu m(2) capacitance density | Huang, C. C.; Chiang, K. C.; Kao, H. L.; Chin, Albert; Chen, W. J.; 奈米科技中心; Center for Nanoscience and Technology |
| 1-Jan-2010 | A Study on Frequency-Dependent Voltage Nonlinearity of SrTiO(3) rf Capacitor | Cheng, C. H.; Huang, C. C.; Hsu, H. H.; Chen, P. C.; Chiang, K. C.; Chin, Albert; Yeh, F. S.; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-Jan-2010 | A Study on Frequency-Dependent Voltage Nonlinearity of SrTiO3 rf Capacitor | Cheng, C. H.; Huang, C. C.; Hsu, H. H.; Chen, P. C.; Chiang, K. C.; Chin, Albert; Yeh, F. S.; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 2007 | Thermal leakage improvement by using a high-work-function ni electrode in high-kappa TiHfO metal-insulator-metal capacitors | Chiang, K. C.; Huang, C. C.; Pan, H. C.; Hsiao, C. N.; Lin, J. W.; Hsieh, I. J.; Cheng, C. H.; Chou, C. P.; Chin, A.; Hwang, H. L.; McAlister, S. P.; 機械工程學系; 奈米科技中心; Department of Mechanical Engineering; Center for Nanoscience and Technology |
| 1-Aug-2007 | Use of a high-work-function ni electrode to improve the stress reliability of Analog SrTiO3 metal-insulator-metal capacitors | Chiang, K. C.; Cheng, C. H.; Jhou, K. Y.; Pan, H. C.; Hsiao, C. N.; Chou, C. P.; McAlister, S. P.; Chin, Albert; Hwang, H. L.; 機械工程學系; 電子工程學系及電子研究所; Department of Mechanical Engineering; Department of Electronics Engineering and Institute of Electronics |
| 2007 | Very high density (44 fF/mu m(2)) SrTiO3 MIM capacitors for RF applications | Chiang, K. C.; Lin, J. W.; Pan, H. C.; Hsiao, C. N.; Chen, W. J.; Kao, H. L.; Hsieh, I. J.; Chin, Albert; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
