瀏覽 的方式： 作者 Chiou, TB
顯示 1 到 4 筆資料，總共 4 筆
| 公開日期 | 標題 | 作者 |
| 1-八月-2001 | Expanding the process window and reducing the optical proximity effect by post-exposure delay | Ku, CY; Shieh, JM; Chiou, TB; Lin, HK; Lei, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 2000 | New overlay pattern design for real-time focus and tilt monitor | Ku, CY; Lei, TF; Shieh, JM; Chiou, TB; Lin, HK; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-十月-2000 | Postexposure delay effect on linewidth variation in base added chemically amplified resist | Ku, CY; Shieh, JM; Chiou, TB; Lin, HK; Lei, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 2000 | Real-time process control to prevent CD variation induced by post exposure delay | Ku, CY; Lei, TF; Shieh, JM; Chiou, TB; Chen, YC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
