瀏覽 的方式： 作者 Ho, KJ
顯示 1 到 3 筆資料，總共 3 筆
| 公開日期 | 標題 | 作者 |
| 1-七月-1998 | Controlling the diffusion of implanted boron in Si and silicide by multiple implants | Chu, CH; Ho, KJ; Huang, CT; Shvu, SH; Lei, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-十二月-1996 | Suppression of boron penetration in BF2+-implanted poly-Si gate | Chao, TS; Chu, CH; Wang, CF; Ho, KJ; Lei, TF; Lee, CL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-十二月-1996 | Suppression of boron penetration in BF2+-implanted poly-Si gate | Chao, TS; Chu, CH; Wang, CF; Ho, KJ; Lei, TF; Lee, CL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
