瀏覽 的方式： 作者 Ho, WL
顯示 1 到 2 筆資料，總共 2 筆
| 公開日期 | 標題 | 作者 |
| 1-六月-2005 | Continuous and precise work function adjustment for integratable dual metal gate CMOS technology using Hf-Mo binary alloys | Li, TL; Hu, CH; Ho, WL; Wang, HCH; Chang, CY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-六月-2006 | Novel dual-metal gate technology using Mo-MoSix combination | Li, TL; Ho, WL; Chen, HB; Wang, HCH; Chang, CY; Hu, CM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
