瀏覽 的方式： 作者 Hsia, CC
顯示 1 到 2 筆資料，總共 2 筆
| 公開日期 | 標題 | 作者 |
| 1999 | Anti-reflection strategies for sub-0.18-mu m dual damascene structure patterning in KrF 248nm lithography | Chou, SY; Wang, CM; Hsia, CC; Chen, LJ; Hwang, GW; Lee, SD; Lou, JC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-十二月-2000 | Plasma charging damage during contact hole etch in high-density plasma etcher | Tsui, BY; Lin, SS; Tsai, CS; Hsia, CC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
