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Issue Date
Title
Author(s)
1999
Anti-reflection strategies for sub-0.18-mu m dual damascene structure patterning in KrF 248nm lithography
Chou, SY
;
Wang, CM
;
Hsia, CC
;
Chen, LJ
;
Hwang, GW
;
Lee, SD
;
Lou, JC
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics