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Showing results 1 to 1 of 1
Issue Date
Title
Author(s)
1-May-2004
Effect of deposition temperature, on thermal stability in high-density plasma chemical vapor deposition fluorine-doped silicon dioxide
Cheng, YL
;
Wang, YL
;
Chen, HW
;
Lan, JL
;
Liu, CP
;
Wu, SA
;
Wu, YL
;
Lo, KY
;
Feng, MS
;
材料科學與工程學系
;
Department of Materials Science and Engineering
