瀏覽 的方式: 作者 Liou, BW
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| 公開日期 | 標題 | 作者 |
| 1-五月-1999 | Applications of total reflection X-ray fluorescence to analysis of VLSI micro contamination | Liou, BW; Lee, CL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-四月-2000 | Characteristics of high breakdown voltage Schottky barrier diodes using p(+)-polycrystalline-silicon diffused-guard-ring | Liou, BW; Lee, CL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-六月-1997 | Hydrogen and oxygen plasma effects on polycrystalline silicon thin films of various thicknesses | Liou, BW; Lee, CL; Lei, TF; Wu, YH; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 8-十二月-2000 | Plasma effects of fluorine implantation on As+-doped polycrystalline silicon thin films of various thicknesses | Liou, BW; Lee, CL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-十二月-1999 | Variations of X-ray spectrum in total reflection X-ray fluorescence (TXRF) analysis with respect to Si wafer crystal orientation for different incident angles | Liou, BW; Lee, CL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |