| Issue Date | Title | Author(s) |
| 1-Nov-1998 | Application of plasma immersion ion implantation doping to low-temperature processed poly-Si TFT's | Yeh, CF; Chen, TJ; Liu, C; Shao, JQ; Cheung, NW; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 31-Oct-1997 | Chemical-mechanical polishing of low-dielectric-constant spin-on-glasses: film chemistries, slurry formulation and polish selectivity | Wang, YL; Liu, C; Chang, ST; Tsai, MS; Feng, MS; Tseng, WT; 材料科學與工程學系; 電子工程學系及電子研究所; Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics |
| 31-Oct-1997 | Effects of corrosion environments on the surface finishing of copper chemical mechanical polishing | Wang, MT; Tsai, MS; Liu, C; Tseng, WT; Chang, TC; Chen, LJ; Cheng, MC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 31-Oct-1997 | Effects of underlying films on the chemical-mechanical polishing for shallow trench isolation technology | Wang, YL; Liu, C; Feng, MS; Dun, JW; Chou, KS; 材料科學與工程學系; 電子工程學系及電子研究所; Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics |
| 1-Jan-1998 | The exothermic reaction and temperature measurement for tungsten CMP technology and its application on endpoint detection | Wang, YL; Liu, C; Feng, MS; Tseng, WT; 材料科學與工程學系; Department of Materials Science and Engineering |
| 1-Jan-1998 | The exothermic reaction and temperature measurement for tungsten CMP technology and its application on endpoint detection | Wang, YL; Liu, C; Feng, MS; Tseng, WT; 材料科學與工程學系; Department of Materials Science and Engineering |
| 1998 | Highly reliable liquid-phase deposited SiO2 with nitrous oxide plasma post-treatment for low temperature processed poly-Si TFT's | Yeh, CF; Chen, DC; Lu, CY; Liu, C; Lee, ST; Liu, CH; Chen, TJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-Oct-2002 | Highly reliable liquid-phase-deposited SiO2 with nitrous oxide plasma post-treatment for low-temperature-processed polysilicon thin film transistors | Yeh, CF; Chen, DCH; Lu, CY; Liu, C; Lee, ST; Liu, CH; Chen, TJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-May-1999 | Hydrogenation of polysilicon thin-film transistor in a planar inductive H-2/Ar discharge | Yeh, CF; Chen, TJ; Liu, C; Gudmundsson, JT; Lieberman, MA; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-Jan-1998 | A modified multi-chemicals spray cleaning process for post-CMP cleaning application | Wang, YL; Liu, C; Feng, MS; Tseng, WT; 材料科學與工程學系; 電子工程學系及電子研究所; Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics |
| 1-Jan-1998 | A modified multi-chemicals spray cleaning process for post-CMP cleaning application | Wang, YL; Liu, C; Feng, MS; Tseng, WT; 材料科學與工程學系; 電子工程學系及電子研究所; Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics |
