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Issue Date
Title
Author(s)
1-Jul-2003
Effect of substrate on the step coverage of plasma-enhanced chemical-vapor deposited tetraethylorthosilicate films
Lan, JK
;
Wang, YL
;
Chao, CG
;
Lo, K
;
Cheng, YL
;
材料科學與工程學系
;
Department of Materials Science and Engineering