| Issue Date | Title | Author(s) |
| 1-Jun-2000 | AlSixNy as an embedded layer for attenuated phase-shifting mask in 193 nm and the utilization of a chemically amplified negative resist NEB-22 for maskmaking | Loong, WA; Lin, CM; 應用化學系; Department of Applied Chemistry |
| 1-Dec-2000 | AlSixOy as a high-transmittance embedded material of ternary attenuated phase-shifting mask and correlation between chemical composition and optical properties of AlSixOy in 193 nm lithography | Lin, CM; Loong, WA; 應用化學系; Department of Applied Chemistry |
| 1-Jun-2002 | Chemical stability of embedded material for attenuated phase-shifting mask and application of high-transmittance attenuated phase-shifting mask for 0.1 mu m contact pattern in 193 nm lithography | Lin, CM; Loong, WA; 應用化學系; Department of Applied Chemistry |
| 1-Nov-2000 | Correlation between the chemical compositions and optical properties of AlSixNy embedded layer for attenuated phase-shifting mask in 193 nm and the modification of the R-T method for measuring n and k | Lin, CM; Loong, WA; 應用化學系; Department of Applied Chemistry |
| 1-Sep-2001 | The correlation between the chemical compositions and optical properties of TiSixNy as an embedded layer for AttPSM in 193 nm | Loong, WA; Lin, CM; Tseng, SP; Yeh, WL; 應用化學系; Department of Applied Chemistry |
| 1-Mar-2006 | Modified reflectance-transmittance method for the metrology of thin film optical properties | Yeh, KT; Lin, CH; Hu, JR; Loong, WA; 應用化學系; Department of Applied Chemistry |
| 1-Sep-2001 | The simulation of application of high transmittance AttPSM for sub-100 nm pattern in 248 nm lithography | Lin, CM; Loong, WA; 應用化學系; Department of Applied Chemistry |
| 1-Apr-2006 | Simulations of mask error enhancement factor in 193nm immersion lithography | Yeh, KT; Loong, WA; 應用化學系; Department of Applied Chemistry |
| 1999 | Studies of nitride- and oxide-based materials as absorptive shifters for embedded attenuated phase-shifting mask in 193 nm | Lin, CM; Chang, KW; Lee, MD; Loong, WA; 應用化學系; Department of Applied Chemistry |
| 1-Feb-1997 | Study on optimization of annular off-axis illumination using Taguchi method for 0.35 mu m dense line/space | Loong, WA; Tseng, JC; Chen, TC; Lung, CA; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry |
| 1-Jan-1996 | TiNx as a new embedded material for attenuated phase shift mask | Loong, WA; Chen, TC; Tseng, JC; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry |
| 1-May-1999 | TiSixNy and TiSixOyNz as embedded materials for attenuated phase-shifting mask in 193 nm | Lin, CM; Loong, WA; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry |
| 1-Mar-1998 | TiSixOy as an absorptive shifter for embedded phase-shifting mask in 248 nm and the modification of R-T method for the determination of shifter's n and k | Loong, WA; Chen, CW; Chang, YH; Lin, CM; Cui, Z; Lung, CA; 應用化學系; Department of Applied Chemistry |
