National Chiao Tung University Institutional Repository：瀏覽交通大學機構典藏

瀏覽的方式：作者 Loong, WA

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公開日期	標題	作者
1-六月-2000	AlSixNy as an embedded layer for attenuated phase-shifting mask in 193 nm and the utilization of a chemically amplified negative resist NEB-22 for maskmaking	Loong, WA; Lin, CM; 應用化學系; Department of Applied Chemistry
1-十二月-2000	AlSixOy as a high-transmittance embedded material of ternary attenuated phase-shifting mask and correlation between chemical composition and optical properties of AlSixOy in 193 nm lithography	Lin, CM; Loong, WA; 應用化學系; Department of Applied Chemistry
1-六月-2002	Chemical stability of embedded material for attenuated phase-shifting mask and application of high-transmittance attenuated phase-shifting mask for 0.1 mu m contact pattern in 193 nm lithography	Lin, CM; Loong, WA; 應用化學系; Department of Applied Chemistry
1-十一月-2000	Correlation between the chemical compositions and optical properties of AlSixNy embedded layer for attenuated phase-shifting mask in 193 nm and the modification of the R-T method for measuring n and k	Lin, CM; Loong, WA; 應用化學系; Department of Applied Chemistry
1-九月-2001	The correlation between the chemical compositions and optical properties of TiSixNy as an embedded layer for AttPSM in 193 nm	Loong, WA; Lin, CM; Tseng, SP; Yeh, WL; 應用化學系; Department of Applied Chemistry
1-三月-2006	Modified reflectance-transmittance method for the metrology of thin film optical properties	Yeh, KT; Lin, CH; Hu, JR; Loong, WA; 應用化學系; Department of Applied Chemistry
1-九月-2001	The simulation of application of high transmittance AttPSM for sub-100 nm pattern in 248 nm lithography	Lin, CM; Loong, WA; 應用化學系; Department of Applied Chemistry
1-四月-2006	Simulations of mask error enhancement factor in 193nm immersion lithography	Yeh, KT; Loong, WA; 應用化學系; Department of Applied Chemistry
1999	Studies of nitride- and oxide-based materials as absorptive shifters for embedded attenuated phase-shifting mask in 193 nm	Lin, CM; Chang, KW; Lee, MD; Loong, WA; 應用化學系; Department of Applied Chemistry
1-二月-1997	Study on optimization of annular off-axis illumination using Taguchi method for 0.35 mu m dense line/space	Loong, WA; Tseng, JC; Chen, TC; Lung, CA; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1-Jan-1996	TiNx as a new embedded material for attenuated phase shift mask	Loong, WA; Chen, TC; Tseng, JC; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1-May-1999	TiSixNy and TiSixOyNz as embedded materials for attenuated phase-shifting mask in 193 nm	Lin, CM; Loong, WA; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1-Mar-1998	TiSixOy as an absorptive shifter for embedded phase-shifting mask in 248 nm and the modification of R-T method for the determination of shifter's n and k	Loong, WA; Chen, CW; Chang, YH; Lin, CM; Cui, Z; Lung, CA; 應用化學系; Department of Applied Chemistry

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