| 公開日期 | 標題 | 作者 |
| 2010 | Characteristics of Zinc Oxide Thin Film Transistors Fabricated by Location-Controlled Hydrothermal Method | Yang, P. Y.; Wang, J. L.; Tsai, W. C.; Wang, S. J.; Chen, P. C.; Su, N. C.; Lin, J. C.; Lee, I. C.; Chang, C. T.; Wei, Y. C.; Cheng, H. C.; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-七月-2009 | Flat band voltage control on low V(t) metal-gate/high-kappa CMOSFETs with small EOT | Chin, Albert; Chang, M. F.; Lin, S. H.; Chen, W. B.; Lee, P. T.; Yeh, F. S.; Liao, C. C.; Li, M. -F.; Su, N. C.; Wang, S. J.; 電子工程學系及電子研究所; 光電工程學系; Department of Electronics Engineering and Institute of Electronics; Department of Photonics |
| 1-七月-2009 | Flat band voltage control on low V-t metal-gate/high-kappa CMOSFETs with small EOT | Chin, Albert; Chang, M. F.; Lin, S. H.; Chen, W. B.; Lee, P. T.; Yeh, F. S.; Liao, C. C.; Li, M. -F.; Su, N. C.; Wang, S. J.; 電子工程學系及電子研究所; 光電工程學系; 光電工程研究所; Department of Electronics Engineering and Institute of Electronics; Department of Photonics; Institute of EO Enginerring |
| 1-十二月-2009 | High-Performance InGaZnO Thin-Film Transistors Using HfLaO Gate Dielectric | Su, N. C.; Wang, S. J.; Chin, Albert; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-十二月-2007 | HtLaON n-MOSFETs using a low work function HfSix gate | Cheng, C. F.; Wu, C. H.; Su, N. C.; Wang, S. J.; McAlister, S. P.; Chin, Albert; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 2010 | A Low Operating Voltage ZnO Thin Film Transistor Using a High-kappa HfLaO Gate Dielectric | Su, N. C.; Wang, S. J.; Chin, Albert; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-一月-2008 | Low V-t gate-first Al/TaN/[Ir3Si-HfSi2-x]/HfLaON CMOS using simple laser annealing/reflection | Liao, C. C.; Chin, Albert; Su, N. C.; Li, M. -F.; Wang, S. J.; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 2008 | Low V-t gate-first Al/TaN/[Ir3Si-HfSi2-x]/HfLaON CMOS using simple laser annealing/reflection | Liao, C. C.; Chin, Albert; Su, N. C.; Li, M. -F.; Wang, S. J.; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 2007 | Very low V(t) [Ir-Hf]/HfLaO CMOS using novel self-aligned low temperature shallow junctions | Cheng, C. F.; Wu, C. H.; Su, N. C.; Wang, S. J.; McAlister, S. P.; Chin, Albert; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
