Browsing by Author TSAI, MJ
Showing results 1 to 8 of 8
| Issue Date | Title | Author(s) |
| 1-Jun-1995 | CHARACTERIZATION OF H-2/N-2 PLASMA PASSIVATION PROCESS FOR POLY-SI THIN-FILM TRANSISTORS (TFTS) | TSAI, MJ; WANG, FS; CHENG, KL; WANG, SY; FENG, MS; CHENG, HC; 材料科學與工程學系; 電子工程學系及電子研究所; Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics |
| 1-Nov-1995 | THE EFFECTS OF NH3 PLASMA PASSIVATION ON POLYSILICON THIN-FILM TRANSISTORS | WANG, FS; TSAI, MJ; CHENG, HC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 25-Apr-1994 | EFFECTS OF ZRO2 ON THE TEXTURING AND PROPERTIES OF MELT-PROCESSED Y1BA2CU3O7-DELTA | JUANG, JY; WU, CL; WANG, SJ; CHU, ML; WU, KH; UEN, TM; GOU, YS; CHANG, HL; WANG, C; TSAI, MJ; 電子物理學系; Department of Electrophysics |
| 1-Feb-1995 | ELECTRICAL CHARACTERISTICS OF THIN-FILM TRANSISTORS WITH DOUBLE-ACTIVE-LAYER STRUCTURE | TSAI, MJ; WANG, PW; SU, HP; CHENG, HC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 15-Sep-1994 | GRAIN-GROWTH OF LASER-RECRYSTALLIZED POLYCRYSTALLINE AND AMORPHOUS-SILICON FILMS | TSAI, MJ; CHENG, HC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-Oct-1995 | LOW-TEMPERATURE ACTIVATION AND RECRYSTALLIZATION OF B+-IMPLANTED AND BF2+-IMPLANTED LPCVD AMORPHOUS-SI FILMS | CHENG, HC; WANG, FS; HUANG, YF; HUANG, CY; TSAI, MJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-Jan-1994 | A NEW PORTRAYAL OF OXIDATION OF UNDOPED POLYCRYSTALLINE SILICON FILMS IN A SHORT-DURATION | WANG, PW; SU, HP; TSAI, MJ; HONG, G; FENG, MS; CHENG, HC; 奈米中心; Nano Facility Center |
| 1-Sep-1994 | REVERSE ANNEALING OF ARSENIC-IMPLANTED LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION (LPCVD) AMORPHOUS-SILICON FILMS | TSAI, MJ; WANG, FS; CHENG, HC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
