瀏覽 的方式： 作者 Tay, Li-Lin
顯示 1 到 2 筆資料，總共 2 筆
| 公開日期 | 標題 | 作者 |
| 2008 | Fluorinated HfO2 Gate Dielectrics Engineering for CMOS by pre- and post-CF4 Plasma Passivation | Wu, Woei-Chemg; Lai, Chao-Sung; Lee, Shih-Ching; Ma, Ming-Wen; Chao, Tien-Sheng; Wang, Jer-Chyi; Hsu, Chih-Wei; Chou, Pai-Chi; Chen, Jian-Hao; Kao, Kuo-Hsing; Lo, Wen-Cheng; Lu, Tsung-Yi; Tay, Li-Lin; Rowell, Nelson; 電子物理學系; Department of Electrophysics |
| 14-八月-2006 | Suppression of interfacial reaction for HfO2 on silicon by pre-CF4 plasma treatment | Lai, Chao Sung; Wu, Woei Cherng; Chao, Tien Sheng; Chen, Jian Hao; Wang, Jer Chyi; Tay, Li-Lin; Rowell, Nelson; 物理研究所; 電子工程學系及電子研究所; Institute of Physics; Department of Electronics Engineering and Institute of Electronics |
