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Issue DateTitleAuthor(s)
1-Jan-2015Effect of Porogen Incorporation on Pore Morphology of Low-k SiCxNy Films Prepared Using PECVDTu, Hung-En; Su, Chun-Jen; Jeng, U-Ser; Leu, Jihperng; 材料科學與工程學系; Department of Materials Science and Engineering
1-Nov-2012Effect of surfactants on the porogen size in the low-k methylsilsesquioxane/polystyrene hybrid filmsChen, Yu-Han; Tu, Hung-En; Leu, Jihperng; 材料科學與工程學系; Department of Materials Science and Engineering
2012Low-k SiCxNy Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Using 1,3,5-trimethyl-1,3,5-trivinylcyclotrisilazane PrecursorTu, Hung-En; Chen, Yu-Han; Leu, Jihperng; 材料科學與工程學系; Department of Materials Science and Engineering
1-Sep-2015Pore morphology of low-k SiCxNy films prepared with a cyclic silazane precursor using plasma-enhanced chemical vapor depositionTu, Hung-En; Su, Chun-Jen; Jeng, U-Ser; Leu, Jihperng; 材料科學與工程學系; Department of Materials Science and Engineering
2014利用電漿輔助化學氣相沉積系統製備低介電碳氮化矽薄膜之研究凃弘恩; Tu, Hung-En; 呂志鵬; Leu, Jihperng; 材料科學與工程學系所
Showing results 1 to 5 of 5