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Showing results 1 to 7 of 7
Issue DateTitleAuthor(s)
1-Apr-2002An adaptive and robust watermarking method based on VQHuang, HC; Wang, FS; Pan, JS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Jan-1997Effects of NH3 plasma passivation on N-channel polycrystalline silicon thin-film transistorsCheng, HC; Wang, FS; Huang, CY; 奈米中心; Nano Facility Center
1-Jan-1997Effects of NH3 plasma passivation on N-channel polycrystalline silicon thin-film transistorsCheng, HC; Wang, FS; Huang, CY; 奈米中心; Nano Facility Center
1-Feb-1996Investigation of the dosage effect on the activation of arsenic- and boron-implanted low-pressure chemical vapor deposition (LPCVD) amorphous-silicon filmsWang, FS; Tsai, MJ; Lai, WK; Cheng, HC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1997Novel N2O plasma passivation on polycrystalline silicon thin-film transistorsWang, FS; Huang, CY; Cheng, HC; 交大名義發表; 奈米中心; National Chiao Tung University; Nano Facility Center
1-Apr-1997Plasma passivation effects on polycrystalline silicon thin-film transistors utilizing nitrous oxide plasmaWang, FS; Huang, CY; Cheng, HC; 電子工程學系及電子研究所; 奈米中心; Department of Electronics Engineering and Institute of Electronics; Nano Facility Center
15-Jan-2000Thin-film transistors with polycrystalline silicon films prepared by two-step rapid thermal annealingCheng, HC; Huang, CY; Wang, FS; Lin, KH; Tarntair, FG; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
Showing results 1 to 7 of 7