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Title: 新穎反向式微影技術應用於CMOS 32奈米節點及其以下之光學鄰近修正術(OPC)與可製造性設計(DFM)
Inverse Lithography Solution for Optical Proximity Correction and Design for Manufacturing for CMOS 32nm Node and beyond
Authors: 余沛慈
Yu Peichen
國立交通大學光電工程學系(所)
Issue Date: 2009
Gov't Doc #: NSC98-2221-E009-111-MY2
URI: http://hdl.handle.net/11536/101732
https://www.grb.gov.tw/search/planDetail?id=1903573&docId=315423
Appears in Collections:Research Plans


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