Title: 12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---總計畫 (I)
Research and Development of CVD Process Equipment for a 12-inch Single Silicon Wafer and Growth of BST Dielectric Thin Film(I)
Authors: 林清發
LIN TSING-FA
國立交通大學機械工程研究所
Issue Date: 2000
Gov't Doc #: NSC89-2212-E009-078
URI: http://hdl.handle.net/11536/102869
https://www.grb.gov.tw/search/planDetail?id=549676&docId=101492
Appears in Collections:Research Plans