Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 呂宗熙 | en_US |
| dc.contributor.author | 蘇侯舉 | en_US |
| dc.date.accessioned | 2014-12-16T06:13:33Z | - |
| dc.date.available | 2014-12-16T06:13:33Z | - |
| dc.date.issued | 2005-12-16 | en_US |
| dc.identifier.govdoc | H01F041/04 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/104221 | - |
| dc.description.abstract | 本發明係提供一種薄膜式電磁線圈之製作方法，係利用原子力顯微鏡進行微影(Force Lithography)加工，製造具有奈米等級的電磁線圈，進而提高其磁場強度；其係利用原子力微影顯微技術於一薄膜基材上進行加工，使其呈現凹陷結構，再經由一微機電製程，形成一具有奈米等級、高磁場強度的薄膜式電磁線圈，以達到降低成本、提升電磁線圈效率之功能。 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.title | 薄膜式電磁線圈之製作方法 | zh_TW |
| dc.type | Patents | en_US |
| dc.citation.patentcountry | TWN | zh_TW |
| dc.citation.patentnumber | 200540887 | zh_TW |
| Appears in Collections: | Patents | |
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