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dc.contributor.authorLee, Ya-Juen_US
dc.contributor.authorLu, Tien-Changen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.contributor.authorWang, Shing-Chungen_US
dc.date.accessioned2014-12-08T15:13:56Z-
dc.date.available2014-12-08T15:13:56Z-
dc.date.issued2007-06-01en_US
dc.identifier.issn1551-319Xen_US
dc.identifier.urihttp://dx.doi.org/10.1109/JDT.2007.894380en_US
dc.identifier.urihttp://hdl.handle.net/11536/10741-
dc.description.abstractThis paper reviews our recent progress of GaN-based high brightness light-emitting diodes (LEDs). Firstly, by adopting chemical wet etching patterned sapphire substrates in GaN-based LEDs, not only could increase the extraction quantum efficiency, but also improve the internal quantum efficiency. Secondly, we present a high light-extraction 465-nm GaN-based vertical light-emitting diode structure with double diffuse surfaces. The external quantum efficiency was demonstrated to be about 40%. The high performance LED was achieved mainly due to the strong guided-light scattering efficiency while employing double diffuse surfaces.en_US
dc.language.isoen_USen_US
dc.subjectextraction quantum efficiencyen_US
dc.subjectGaNen_US
dc.subjectinternal quantum efficiencyen_US
dc.subjectlight-emitting diodes (LEDs)en_US
dc.titleHigh brightness GaN-based light-emitting diodesen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/JDT.2007.894380en_US
dc.identifier.journalJOURNAL OF DISPLAY TECHNOLOGYen_US
dc.citation.volume3en_US
dc.citation.issue2en_US
dc.citation.spage118en_US
dc.citation.epage125en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000259064300005-
dc.citation.woscount27-
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