Title: Electric stress effect on DC-RF performance degradation of 0.18-mu m mosfets
Authors: Chen, C. C.
Kao, H. L.
Chin, Albert
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
Keywords: stress;I-V;current gain;S parameters;NFmin
Issue Date: 1-Oct-2006
Abstract: We have studied the electric stress effect on DC-RF performance degradation of 64 gate fingers 0.18-mu m RF MOSFETs. The fresh devices show good transistor's DC to RF characteristics of small sub-threshold swing of 85 mV/dec, large drive current (I-d,I-sat) of 500 mu A/mu m, high unity-gain cut-off frequency (f(t)) of 47 GHz, and low minimum not. se figure (NFmin) of 1.3 dB at 10 GHz. The hot carrier stress for 20% I-d,I-sat reduction causes DC g(m) and r(o) degradation as well as the lower RF current gain by 2.35 dB, f(t) reduction to 35.7 GHz, increasing NFmin to 1.7 dB at 10 GHz and poor output impedance matching. (C) 2006 Wiley Periodicals, Inc.
URI: http://dx.doi.org/10.1002/mop.21813
http://hdl.handle.net/11536/11705
ISSN: 0895-2477
DOI: 10.1002/mop.21813
Journal: MICROWAVE AND OPTICAL TECHNOLOGY LETTERS
Volume: 48
Issue: 10
Begin Page: 1916
End Page: 1919
Appears in Collections:Articles


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