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dc.contributor.author陳智en_US
dc.contributor.author劉健民en_US
dc.contributor.author曾院介en_US
dc.date.accessioned2015-05-12T02:59:59Z-
dc.date.available2015-05-12T02:59:59Z-
dc.date.issued2015-02-01en_US
dc.identifier.govdocH01L031/07zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/122919-
dc.description.abstract本發明係有關於一種光感測元件及其製備方法,本發明之光感測元件具有極大蕭特基接面且其包括:一第一導電層;複數金屬奈米線,該每一金屬奈米線之一端係與該第一導電層連接,且該每一金屬奈米線之表面係覆有一半導體層,該半導體層之厚度係為1nm-20nm;以及一第二導電層,係對應該第一導電層而配置,該複數金屬奈米線係配置於該第一導電層與該第二導電層之間,且該第二導電層與該複數金屬奈米線表面之半導體層接觸;其中,該光感測元件係用於感測波長10nm-400nm之紫外光。zh_TW
dc.language.isozh_TWen_US
dc.title光感測元件及其製備方法zh_TW
dc.typePatentsen_US
dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumberI472048zh_TW
Appears in Collections:Patents


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