Title: Enhancing the Realism of Sketch and Painted Portraits With Adaptable Patches
Authors: Lee, Yin-Hsuan
Chang, Yu-Kai
Chang, Yu-Lun
Lin, I-Chen
Wang, Yu-Shuen
Lin, Wen-Chieh
資訊工程學系
多媒體工程研究所
Department of Computer Science
Institute of Multimedia Engineering
Keywords: facial modelling;matting & compositing
Issue Date: 1-Feb-2018
Abstract: Realizing unrealistic faces is a complicated task that requires a rich imagination and comprehension of facial structures. When face matching, warping or stitching techniques are applied, existing methods are generally incapable of capturing detailed personal characteristics, are disturbed by block boundary artefacts, or require painting-photo pairs for training. This paper presents a data-driven framework to enhance the realism of sketch and portrait paintings based only on photo samples. It retrieves the optimal patches of adaptable shapes and numbers according to the content of the input portrait and collected photos. These patches are then seamlessly stitched by chromatic gain and offset compensation and multi-level blending. Experiments and user evaluations show that the proposed method is able to generate realistic and novel results for a moderately sized photo collection.
URI: http://dx.doi.org/10.1111/cgf.13261
http://hdl.handle.net/11536/144601
ISSN: 0167-7055
DOI: 10.1111/cgf.13261
Journal: COMPUTER GRAPHICS FORUM
Volume: 37
Begin Page: 214
End Page: 225
Appears in Collections:Articles