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dc.contributor.authorLin, Che-Yuen_US
dc.contributor.authorLin, Kun-Linen_US
dc.contributor.authorLin, Chien-Chengen_US
dc.date.accessioned2019-09-02T07:46:17Z-
dc.date.available2019-09-02T07:46:17Z-
dc.date.issued2019-01-01en_US
dc.identifier.issn1820-6131en_US
dc.identifier.urihttp://dx.doi.org/10.2298/PAC1902115Len_US
dc.identifier.urihttp://hdl.handle.net/11536/152669-
dc.description.abstractReactions between different kinds of ceramics and silicon were studied to evaluate ceramics as candidates for their use in the process of silicon-crystal growth. Three types of ceramic plates, Al2O3, ZrO2 and quartz (SiO2), were put into contact with a silicon wafer via annealing at 1450 degrees C for 30 min under an Ar atmosphere. Defects appeared at the Si-ceramics interface. Among these, a crack and a dislocation pile up were found at the Si-SiO2 dissolution couple. In addition, two intermetallic compounds, Y2Si2O7 and Zr-Si, produced by the diffusion of Y, O and Zr from the ZrO2 into the Si, were found at the Si-ZrO2 dissolution couple. At the interface of the Si-Al2O3 dissolution couple, no intermetallic compounds and few defects were found. The oxygen concentration and electrical resistivity near the interface were high and gradually decreased away from the interface for all Si-ceramics dissolution couples.en_US
dc.language.isoen_USen_US
dc.subjectceramic crucibleen_US
dc.subjectsiliconen_US
dc.subjectinterfaceen_US
dc.subjectSi dissolution coupleen_US
dc.subjectcrystal growthen_US
dc.titleReactions between Si melt and various ceramicsen_US
dc.typeArticleen_US
dc.identifier.doi10.2298/PAC1902115Len_US
dc.identifier.journalPROCESSING AND APPLICATION OF CERAMICSen_US
dc.citation.volume13en_US
dc.citation.issue2en_US
dc.citation.spage115en_US
dc.citation.epage123en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000475961200001en_US
dc.citation.woscount0en_US
Appears in Collections:Articles