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國立陽明交通大學機構典藏
學術出版
會議論文
標題:
Embedded PUF on 14nm HKMG FinFET Platform: A Novel 2-bit-per-cell OTP-based Memory Feasible for IoT Secuirty Solution in 5G Era
作者:
Hsieh, E. R.
Wang, H. W.
Liu, C. H.
Chung, Steve S.
Chen, T. P.
Huang, S. A.
Chen, T. J.
Cheng, Osbert
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期:
1-一月-2019
摘要:
In this work, a novel concept of 2-bit-per-cell (2B/C) is introduced to realize high-density OTP PUF from a new scheme of dielectric breakdown. This PUF shows 10(5)x of large window, good immunity to high-temperature disturbance, and excellent retention under 150 degrees C baking, which are particularly for automotive applications. In terms of security. this PUF exhibits near ideal normal distribution of hamming distance and narrow distribution of hamming weight. The bit error rates are low, 0.78% at 25 degrees C and 1.95% at 150 degrees C, benchmarked on a 256-bit array. Finally, the security test of this PUF against the hackers' attack from the machine learning process has been proved to have high security. Overall, the proposed 2B/C OTP PUF demonstrated great potential for IoT security in 5G era.
URI:
http://hdl.handle.net/11536/155279
ISBN:
978-4-86348-719-2; 978-4-86348-717-8
期刊:
2019 SYMPOSIUM ON VLSI TECHNOLOGY
起始頁:
0
結束頁:
0
顯示於類別:
會議論文
IR@NYCU
CrossRef
The Advances of OTP Memory for Embedded Applications in HKMG Generation and Beyond / Chung, Steve S.
The Demonstration of Gate Dielectric -fuse 4kb OTP Memory Feasible for Embedded Applications in High -k Metal-gate CMOS Generations and Beyond / Hsieh, E. R.;Chang, C. W.;Chuang, C. C.;Chen, H. W.;Chung, Steve S.
A 14-nm FinFET Logic CMOS Process Compatible RRAM Flash With Excellent Immunity to Sneak Path / Hsieh, E. Ray;Kuo, Yen Chen;Cheng, Chih-Hung;Kuo, Jing Ling;Jiang, Meng-Ru
A Novel ReWritable One-Time-Programming OTP (RW-OTP) Realized by Dielectric-fuse RRAM Devices Featuring Ultra-High Reliable Retention and Good Endurance for Embedded Applications / Cheng, H. W.;Hsieh, E. R.;Huang, Z. H.;Chuang, C. H.;Chen, C. H.
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