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dc.contributor.authorChen, Fang-Chungen_US
dc.contributor.authorTsai, Tzung-Hanen_US
dc.contributor.authorChien, Shang-Chiehen_US
dc.date.accessioned2014-12-08T15:21:50Z-
dc.date.available2014-12-08T15:21:50Z-
dc.date.issued2012-04-01en_US
dc.identifier.issn1566-1199en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.orgel.2011.12.026en_US
dc.identifier.urihttp://hdl.handle.net/11536/15545-
dc.description.abstractThis paper describes a simple approach for reducing the contact resistances at the source/drain (S/D) contacts in solution-processed n-channel organic thin-film transistors (OTFTs). Blending poly(ethylene glycol) (PEG) into the fullerene semiconducting layer significantly improved the device performance. The PEG molecules in the blends underwent chemical reactions with the Al atoms of the electrodes, thereby forming a better organic-metal interface. Further, the rougher surface obtained after the addition of PEG could also increase the effective contact area, thereby reducing the resistance. As a result, the electrical properties of the devices were significantly improved. Unlike conventional bilayer structures, this approach allows the ready preparation of OTFTs with a low electron injection barrier at the S/D contacts. (c) 2012 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectPolymeren_US
dc.subjectField effecten_US
dc.subjectTransistoren_US
dc.subjectInterfaceen_US
dc.titleSimple source/drain contact structure for solution-processed n-channel fullerene thin-film transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.orgel.2011.12.026en_US
dc.identifier.journalORGANIC ELECTRONICSen_US
dc.citation.volume13en_US
dc.citation.issue4en_US
dc.citation.spage599en_US
dc.citation.epage603en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000300846200010-
dc.citation.woscount1-
Appears in Collections:Articles


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