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dc.contributor.authorZhang, Guo-Yongen_US
dc.contributor.authorLee, Dai-Yingen_US
dc.contributor.authorYao, I-Chuanen_US
dc.contributor.authorHung, Chung-Jungen_US
dc.contributor.authorWang, Sheng-Yuen_US
dc.contributor.authorHuang, Tai-Yuenen_US
dc.contributor.authorWu, Jia-Woeien_US
dc.contributor.authorTseng, Tseung-Yuenen_US
dc.date.accessioned2014-12-08T15:30:43Z-
dc.date.available2014-12-08T15:30:43Z-
dc.date.issued2013-04-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.7567/JJAP.52.041101en_US
dc.identifier.urihttp://hdl.handle.net/11536/21942-
dc.description.abstractUnipolar resistive switching behaviors including bistable memory switching and monostable threshold switching were found in ZrO2 thin films fabricated by a simple sol-gel method with the Ti/ZrO2/Pt structure. The multilevel resistive switching behaviors were also revealed by varying the compliance current from 9 to 38 mA. Physical mechanisms based on a conductive filament model were proposed to explain the resistive switching phenomena and the device breakdown. A figure of merit Z = rho(a)/rho(f) was defined as a criterion for evaluating OFF/ON resistance ratio, where rho(f) and rho(a) represent the resistivities of the conductive filament and the fracture region of the filament, respectively. The advantages such as unipolar resistive switching, multilevel resistive switching, good scalability, low operation voltage (<5 V), high OFF/ON resistance ratio (>10(3)), nondestructive readout, long retention (>10(4) s), and simple fabrication method make the ZrO2-based resistive switching device a promising candidate for next-generation nonvolatile memory applications. (C) 2013 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleUnipolar Resistive Switching in ZrO2 Thin Filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.7567/JJAP.52.041101en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume52en_US
dc.citation.issue4en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000317189300009-
dc.citation.woscount1-
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