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dc.contributor.authorLee, Chia-Yuen_US
dc.contributor.authorLan, Yu-Pinen_US
dc.contributor.authorTu, Po-Minen_US
dc.contributor.authorHsu, Shih-Chiehen_US
dc.contributor.authorLin, Chien-Chungen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.contributor.authorChi, Gou-Chungen_US
dc.contributor.authorChang, Chun-Yenen_US
dc.date.accessioned2014-12-08T15:36:08Z-
dc.date.available2014-12-08T15:36:08Z-
dc.date.issued2014-04-01en_US
dc.identifier.issn1882-0778en_US
dc.identifier.urihttp://dx.doi.org/10.7567/APEX.7.042103en_US
dc.identifier.urihttp://hdl.handle.net/11536/24486-
dc.description.abstractHexagonal inverted pyramid (HIP) structures and the natural substrate lift-off (NSLO) technique were demonstrated on a GaN-based vertical light-emitting diode (VLED). The HIP structures were formed at the interface between GaN and the sapphire substrate by molten KOH wet etching. The threading dislocation density (TDD) estimated by transmission electron microscopy (TEM) was reduced to.1 x 10(8) cm(-2). Raman spectroscopy indicated that the compressive strain from the bottom GaN/sapphire was effectively released through the HIP structure. With the adoption of the HIP structure and NSLO, the light output power and yield performance of leakage current could be further improved. (C) 2014 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleNatural substrate lift-off technique for vertical light-emitting diodesen_US
dc.typeArticleen_US
dc.identifier.doi10.7567/APEX.7.042103en_US
dc.identifier.journalAPPLIED PHYSICS EXPRESSen_US
dc.citation.volume7en_US
dc.citation.issue4en_US
dc.citation.epageen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000336118100010-
dc.citation.woscount0-
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