Title: Chemical bath deposition of IrO2 films on ITO substrate
Authors: Chen, Jing-Yu
Chen, Yong-Min
Sun, Yu
Lee, Jyh-Fu
Chen, San-Yuan
Chen, Po-Chun
Wu, Pu-Wei
交大名義發表
材料科學與工程學系
National Chiao Tung University
Department of Materials Science and Engineering
Keywords: Iridium oxide;Thin film;Chemical bath deposition;Indium tin oxide
Issue Date: 1-Nov-2014
Abstract: A chemical bath is shown to deposit an IrO2 film on an ITO substrate. The chemical bath is prepared by mixing an Ir precursor (Na3IrCl6 center dot xH(2)O), an oxidizer (NaClO), a complexing agent (NaNO2), and a complex agent/stabilizer (NaOH) in an aqueous solution at a molar ratio of 1:1.5:10:30. From the UV-vis absorption spectra, complexes such as [Ir(OH)(6)]m(3-), [Ir(NO2)(4)Cl-2](3-), and [Ir(NO2)(3)Cl-3](3-) are identified. These complexes are relatively stable, minimizing the undesirable homogeneous precipitation of IrO2 nanoparticles in favor of the heterogeneous growth of the IrO2 film on the ITO substrate. Diffraction patterns from the as-deposited IrO2 film reveal an amorphous structure. In addition, profiles from X-ray absorption spectroscopy and X-ray photoelectron spectroscopy indicate that the oxidation state of the Ir in the as-deposited IrO2 film is +4. Thermogravimetric analysis confirms the inclusion of 10 wt% hydrated water in the as-deposited IrO2 film. Scanning electron microscope images reveal a continuous solid film with a smooth surface. The amorphous IrO2 film becomes rutile IrO2 phase after a mild heat treatment in air. (c) 2014 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
URI: http://dx.doi.org/10.1016/j.ceramint.2014.06.098
http://hdl.handle.net/11536/25151
ISSN: 0272-8842
DOI: 10.1016/j.ceramint.2014.06.098
Journal: CERAMICS INTERNATIONAL
Volume: 40
Issue: 9
Begin Page: 14983
End Page: 14990
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