SiCl3CCl3 as a novel precursor for chemical vapor deposition of amorphous carbon films.

Title:	SiCl3CCl3 as a novel precursor for chemical vapor deposition of amorphous carbon films.
Authors:	Chiu, HT Chang, YH Wang, LS Peng, CW Lee, CY 應用化學系 Department of Applied Chemistry
Issue Date:	7-Apr-2002
URI:	http://hdl.handle.net/11536/28864
ISSN:	0065-7727
Journal:	ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
Volume:	223
Issue:
Begin Page:	A48
End Page:	A48
Appears in Collections:	Articles