| Title: | Metalorganic chemical vapor deposition of tungsten carbonitride films by bis(tertbutylimido)bis(diethylamido)tungsten. |
| Authors: | Chuang, SH Chiu, HT Chou, YH Chang, YH Chen, SF Yang, JY 應用化學系 Department of Applied Chemistry |
| Issue Date: | 7-Apr-2002 |
| URI: | http://hdl.handle.net/11536/28866 |
| ISSN: | 0065-7727 |
| Journal: | ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY |
| Volume: | 223 |
| Issue: | |
| Begin Page: | A48 |
| End Page: | A48 |
| Appears in Collections: | Articles |
- Growth of ternary WCxNy thin films from a single-source precursor, W((NBu)-Bu-t)(2)(NEt2)(2) / Chuang, Shiow-Huey;Chiu, Hsin-Tien;Chou, Yi-Hsuan;Chen, Shiou-Fan
- 氮化鎢化學氣相沉積前驅物在Cu(111)與Si(100) (2x1)表面熱分解反應機制之探討 / 吳金寶;Jin-Bao Wu;裘性天;楊耀文;Dr. Hsin-Tien Chiu
- Metalorganic chemical vapor deposition of tungsten nitride for advanced metallization / Tsai, MH;Sun, SC;Chiu, HT;Chuang, SH
- Surface reaction of bis(tertbutylimido)bis(diethylamido)tungsten precursor on Si(100)-(2X1) / Wu, JB;Yang, YW;Lin, YF;Chiu, HT
- Kinetic and mechanistic studies of the chemical vapor deposition of tungsten nitride from bis(tertbutylimido)bis(tertbutylamido)tungsten / Crane, EL;Chiu, HT;Nuzzo, RG
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