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dc.contributor.authorLin, SDen_US
dc.contributor.authorLee, CPen_US
dc.date.accessioned2014-12-08T15:43:08Z-
dc.date.available2014-12-08T15:43:08Z-
dc.date.issued2001-12-01en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.1415060en_US
dc.identifier.urihttp://hdl.handle.net/11536/29197-
dc.description.abstractHole Schottky barrier heights on GaAs have been studied experimentally by using a conventional metal-semiconductor-metal photodetector (MSMPD) structure. The Schottky barrier height for holes was obtained directly by the hole-current dominated dark current measurement of the MSMPD. With a thin, highly doped surface layer, control of the Schottky barrier heights for holes from 0.48 to 0.79 eV was obtained. By using these engineered Schottky contacts in the MSMPDs, over three orders of magnitude reduction in the dark currents of the MSMPDs was achieved. (C) 2001 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleHole Schottky barrier height enhancement and its application to metal-semiconductor-metal photodetectorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.1415060en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume90en_US
dc.citation.issue11en_US
dc.citation.spage5666en_US
dc.citation.epage5669en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000172129200033-
dc.citation.woscount3-
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