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dc.contributor.authorChen, Te-Mingen_US
dc.contributor.authorHung, Jui-Yien_US
dc.contributor.authorPan, Fu-Mingen_US
dc.contributor.authorChang, L.en_US
dc.contributor.authorWu, Shich-Chuanen_US
dc.contributor.authorTien, Ta-Changen_US
dc.date.accessioned2014-12-08T15:09:30Z-
dc.date.available2014-12-08T15:09:30Z-
dc.date.issued2009-05-01en_US
dc.identifier.issn1533-4880en_US
dc.identifier.urihttp://dx.doi.org/10.1166/jnn.2009.203en_US
dc.identifier.urihttp://hdl.handle.net/11536/7251-
dc.description.abstractTo improve electron field emission properties of anodic aluminum oxide (AAO) templated Si nanotips, IrO(2) nanoparticles were deposited on the nanotips using bipolar pulse electrodeposition method. The IrO(2) nanoparticles had a uniform size distribution with an average value of similar to 4 nm, and well dispersed on the ordered Si nanotips. Due to the small radius and a lower work function, the IrO(2)/Si nanotip exhibited field emission properties better than the bare Si nanotip with a field enhancement factor of similar to 128. The SEM and TEM were utilized to investigate the structure and morphology. The physical and chemical properties were evaluated XRD and X-ray photoelectron spectroscopy (XPS).en_US
dc.language.isoen_USen_US
dc.subjectPulse Electrodepositionen_US
dc.subjectField Emissionen_US
dc.subjectSi Nanotipen_US
dc.subjectIridium Oxideen_US
dc.titlePulse Electrodeposition of Iridium Oxide on Silicon Nanotips for Field Emission studyen_US
dc.typeArticleen_US
dc.identifier.doi10.1166/jnn.2009.203en_US
dc.identifier.journalJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGYen_US
dc.citation.volume9en_US
dc.citation.issue5en_US
dc.citation.spage3264en_US
dc.citation.epage3268en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000265186800070-
dc.citation.woscount3-
Appears in Collections:Articles