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dc.contributor.authorChan, Feng-Linen_US
dc.contributor.authorChang, Wen-Yingen_US
dc.contributor.authorKuo, Li-Minen_US
dc.contributor.authorLin, Chih-Hengen_US
dc.contributor.authorWang, Shi-Weien_US
dc.contributor.authorYang, Yuh-Shyongen_US
dc.contributor.authorLu, Michael S-Cen_US
dc.date.accessioned2014-12-08T15:11:18Z-
dc.date.available2014-12-08T15:11:18Z-
dc.date.issued2008-07-01en_US
dc.identifier.issn0960-1317en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0960-1317/18/7/075028en_US
dc.identifier.urihttp://hdl.handle.net/11536/8669-
dc.description.abstractThis paper presents the integration of interdigitated microelectrodes and a CMOS circuit for electrochemical sensing of the neurotransmitter dopamine. Gold electrodes with a gap of 3 mu m are fabricated by the lift-off technique. The CMOS sensing circuit has a current gain of 10, an integrating capacitor of 4 pF, and a measured dynamic range of 60 dB. The applied reduction and oxidation potentials are determined by voltammetry at about -0.2 V and 0.6 V, respectively. The measured collection efficiency can reach up to 84%. The produced oxidation current with respect to dopamine concentration averages 0.44 nA mu M(-1).en_US
dc.language.isoen_USen_US
dc.titleAn electrochemical dopamine sensor with a CMOS detection circuiten_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0960-1317/18/7/075028en_US
dc.identifier.journalJOURNAL OF MICROMECHANICS AND MICROENGINEERINGen_US
dc.citation.volume18en_US
dc.citation.issue7en_US
dc.citation.epageen_US
dc.contributor.department生物科技學系zh_TW
dc.contributor.departmentDepartment of Biological Science and Technologyen_US
dc.identifier.wosnumberWOS:000257128100029-
dc.citation.woscount4-
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