| Title: | 12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---子計畫Ⅲ：利用CVD法成長BST薄膜與特性分析(II) Growth and Characterizations of CVD BST Thin Films(II) |
| Authors: | 曾俊元 TSEUNG-YUENTSENG 國立交通大學電子工程學系 |
| Keywords: | 矽晶圓;化學氣相沉積法;鈦酸鍶鋇薄膜;介電薄膜;Silicon wafer;Chemical vapor deposition (CVD);BST thin film;Dielectric thin film |
| Issue Date: | 2001 |
| Gov't Doc #: | NSC90-2212-E009-076 |
| URI: | http://hdl.handle.net/11536/93516 https://www.grb.gov.tw/search/planDetail?id=662731&docId=125584 |
| Appears in Collections: | Research Plans |
