| Title: | 以雷射技術研究大氣化學之重要分子---(1)氟氯烷取代物研究---與OH之反應速率(2)硫化物氧化研究---CH/sub 3/S與O/sub 3/之反應速率 (1) Freon Substitutes---Reaction Rates with OH (2)Oxidation of Sulfur Compounds---Reaction Rate of CH/sub 3/S+O/sub 3/ |
| Authors: | 王念夏 WANG NIANN SHIAH 交通大學應用化學系 |
| Keywords: | 氟氯烷取代物;反應速率;甲硫基;臭氧;Freon substitute;Reaction rate;Methyl sulfur;Ozone |
| Issue Date: | 1997 |
| Gov't Doc #: | NSC86-2113-M009-013 |
| URI: | http://hdl.handle.net/11536/95415 https://www.grb.gov.tw/search/planDetail?id=274248&docId=49072 |
| Appears in Collections: | Research Plans |
