| Title: | 建立模擬非晶形矽薄膜沉積的化學動力學資料庫(2/3) Chemical Kinetics Database for Simulations of a-Si:H Thin Film Growth |
| Authors: | 林明璋 LIN MING CHANG 國立交通大學應用化學系（所） |
| Issue Date: | 2012 |
| Gov't Doc #: | NSC101-2113-M009-002 |
| URI: | http://hdl.handle.net/11536/97101 https://www.grb.gov.tw/search/planDetail?id=2674767&docId=401481 |
| Appears in Collections: | Research Plans |
- 建立模擬非晶形矽薄膜沉積的化學動力學資料庫( III ) / 林明璋;LIN MING CHANG
- 建立模擬非晶形矽薄膜沉積的化學動力學資料庫( I ) / 林明璋;LIN MING CHANG
- Ab Initio Chemical Kinetics for SiH(3) Reactions with Si(x)H(2x+2) (x=1-4) / Raghunath, P.;Lin, M. C.
- Ab Initio Chemical Kinetics for SiH3 Reactions with SixH2x+2 (x=1-4) / Raghunath, P.;Lin, M. C.
- Ab Initio Chemical Kinetics for SiHx Reactions with Si2Hy (x=1,2,3,4; y=6,5,4,3; x plus y=7) under a-Si:H CVD Condition / Trong-Nghia Nguyen;Lin, M. C.
- Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH4 (+) Ion and Related Reverse Ion-Molecule Reactions of Interest to PECVD of a-Si:H Films / Nguyen, T. N.;Lee, Y. M.;Wu, J. S.;Lin, M. C.
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