DEVELOPMENT OF TEMPERATURE-STABLE THICK-FILM DIELECTRICS .1. LOW-K DIELECTRIC

标题:	DEVELOPMENT OF TEMPERATURE-STABLE THICK-FILM DIELECTRICS .1. LOW-K DIELECTRIC
作者:	CHIOU, BS 交大名义发表电控工程研究所 National Chiao Tung University Institute of Electrical and Control Engineering
公开日期:	1-十二月-1989
URI:	http://dx.doi.org/10.1109/33.49048 http://hdl.handle.net/11536/4256
ISSN:	0148-6411
DOI:	10.1109/33.49048
期刊:	IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY
Volume:	12
Issue:	4
起始页:	789
结束页:	797
显示于类别：	Articles

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APA	CHIOU, B. (1989). DEVELOPMENT OF TEMPERATURE-STABLE THICK-FILM DIELECTRICS .1. LOW-K DIELECTRIC. WOS:A1989CK70700054.
Bibtex	@article{CHIOU1989DEVELOPMENT, title={DEVELOPMENT OF TEMPERATURE-STABLE THICK-FILM DIELECTRICS .1. LOW-K DIELECTRIC}, author={CHIOU, BS}, journal={WOS:A1989CK70700054}, year={1989}, url={http://140.113.37.243/handle/11536/4256?locale=zh_CN}, }