The effects of plasma treatment on the thermal stability of HfAlOx thin films

Title:	The effects of plasma treatment on the thermal stability of HfAlOx thin films
Authors:	Chang, Kow-Ming Chen, Bwo-Ning Huang, Shih-Ming 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
Issue Date:	2007
URI:	http://hdl.handle.net/11536/12045
ISBN:	978-1-4244-1891-6
Journal:	2007 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, VOLS 1 AND 2
Begin Page:	181
End Page:	182
Appears in Collections:	Conferences Paper